NEC-LIST: Reaction Technique and EFIE combined with MFIE

Question: What the difference between the two method mentioned above?

  The Reaction Concept and its application have been discussed by
Rumsey, Cohen, Harrington, and Richmond.(for detail, please read
reference: N. N. Wang and J. H. Richmond "Sinusoidal Reaction
Formulation for Radiation and Scattering from Conducting Surfaces",
IEEE Trans. on AP., Vol.23, No.3, May 1975). It is known that this
technique is based on the sinusoidal reaction fomulation and is
applicable to open as well as closed structures.

  However, EFIE combined with MFIE are used in NEC4 to deal with
voluminous structures, I wonder does any advantages exist in methods
involving EFIE and MFIE? If has, what are the differences between
them?

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Mailing Address:
              Mr. Xinjun Zhang
Dept. of Microwave Telecommunication Engineering
              Xidian University
              Xi'an City,710071
                   China